SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Alternative Lithographic Technologies III - Nanoimprint process for 2.5Tb/in
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bit patterned media fabricated by self-assembling method
Ootera, Yasuaki; Herr, Daniel J. C.; Yuzawa, Akiko; Shimada, Takuya; Yamamoto, Ryousuke; Kamata, Yoshiyuki; Kihara, Naoko; Kikitsu, Akira
- 作者Ootera, Yasuaki; Herr, Daniel J. C.; Yuzawa, Akiko; Shimada, Takuya; Yamamoto, Ryousuke; Kamata, Yoshiyuki; Kihara, Naoko; Kikitsu, Akira
- 卷第7970卷
- 印刷ISSN0277-786X
- 文件大小1175.29KB
- 发表时间2011
- DOI10.1117/12.878936