Dissolution Kinetics in Chemically Amplified EUV Resist
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Yamamoto, Hiroki; Kozawa, Takahiro; Tagawa, Seiichi; Mimura, Takeyoshi; Iwai, Takeshi; Onodera, Junichi
- 卷第24卷
- 期第4期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小1790.83KB
- 发表时间2011
- DOI10.2494/photopolymer.24.405
- 页码405-410
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