[OSA CLEO: Science and Innovations - Baltimore, Maryland (2011..-..)] CLEO:2011 - Laser Applications to Photonic Applications - Low-threshold whispering-gallery dye lasers by planar and 3D lithography on silicon
Grossmann, Tobias; Schleede, Simone; Hauser, Mario; Beck, Torsten; Thiel, Michael; von Freymann, Georg; Mappes, Timo; Kalt, Heinz
- 作者Grossmann, Tobias; Schleede, Simone; Hauser, Mario; Beck, Torsten; Thiel, Michael; von Freymann, Georg; Mappes, Timo; Kalt, Heinz
- 文件大小736.36KB
- 发表时间2011
- DOI10.1364/cleo_si.2011.cml6