Plasma parameter analysis of Ag sputter deposition using cathodes with different magnetic flux densities

• 作者Kazuhiro Kato; Hideo Omoto; Atsushi Takamatsu; Masaaki Yonekura
• 卷第86卷
• 期第10期
• 印刷ISSN0042-207X
• 文件大小390.64KB
• 发表时间2012
• DOI10.1016/j.vacuum.2012.02.007
• 页码1435-1439