Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists

• 作者Matthias E. Bahlke; Hiroshi A. Mendoza; Daniel T. Ashall; Allen S. Yin; Marc A. Baldo
• 印刷ISSN0935-9648
• 电子ISSN1521-4095
• 文件大小751.58KB
• 发表时间2012
• DOI10.1002/adma.201202446