Flat bands near Fermi level of topological line defects on graphite
- 期刊名称Applied Physics Letters
- 作者Feng, Lei; Lin, Xianqing; Meng, Lan; Nie, Jia-Cai; Ni, Jun; He, Lin
- 卷第101卷
- 期第11期
- 印刷ISSN0003-6951
- 文件大小4602.83KB
- 发表时间2012
- DOI10.1063/1.4752441
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