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Multiscale Computational Analysis of the Interaction between the Wafer Micro-Topography and the Film Growth Regimes in Chemical Vapor Deposition Processes

Multiscale Computational Analysis of the Interaction between the Wafer Micro-Topography and the Film Growth Regimes in Chemical Vapor Deposition Processes

Cheimarios, N.; Kokkoris, G.; Boudouvis, A. G.

期刊名称ECS Journal of Solid State Science and Technology
作者Cheimarios, N.; Kokkoris, G.; Boudouvis, A. G.
卷第1卷
期第4期
印刷ISSN2162-8769
电子ISSN2162-8777
文件大小1733.07KB
发表时间2012-08-24
DOI10.1149/2.013204jss

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