Robust and low power register file in 65 nm technology
- 期刊名称Journal of Semiconductors
- 作者Zhang, Xingxing; Li, Yi; Xiong, Baoyu; Han, Jun; Zhang, Yuejun; Dong, Fangyuan; Zhang, Zhang; Yu, Zhiyi; Han, Jun; Cheng, Xu; Zeng, Xiaoyang
- 卷第33卷
- 期第3期
- 印刷ISSN1674-4926
- 文件大小269.93KB
- 发表时间2012-03
- DOI10.1088/1674-4926/33/3/035010
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