Low-Temperature-Processed Zinc Oxide Thin-Film Transistors Fabricated by Plasma-Assisted Atomic Layer Deposition

Y. Kawamura; M. Tani; N. Hattori; N. Miyatake; M. Horita; Y. Ishikawa; Y. Uraoka

作者Y. Kawamura; M. Tani; N. Hattori; N. Miyatake; M. Horita; Y. Ishikawa; Y. Uraoka
文件大小591.40KB
发表时间2012
DOI10.1143/JJAP.51.02BF04

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