SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Quantifying throughput improvements for electron-beam lithography using a suite of benchmark patterns
Hartley, John G.; Tong, William M.; Resnick, Douglas J.; Crosland, Nigel; Dowling, Robert C.; Hoyle, Philip C.; McClelland, Andrew; Turnidge, Martin; Smith, James H.
- 作者Hartley, John G.; Tong, William M.; Resnick, Douglas J.; Crosland, Nigel; Dowling, Robert C.; Hoyle, Philip C.; McClelland, Andrew; Turnidge, Martin; Smith, James H.
- 卷第8680卷
- 印刷ISSN0277-786X
- 文件大小1100.89KB
- 发表时间2013
- DOI10.1117/12.2011664