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Large Area Resist-Free Soft Lithographic Patterning of Graphene

Large Area Resist-Free Soft Lithographic Patterning of Graphene

George, Antony; Mathew, S.; van Gastel, Raoul; Nijland, Maarten; Gopinadhan, K.; Brinks, Peter; Venkatesan, T.; ten Elshof, Johan E.
  • 期刊名称Small
  • 作者George, Antony; Mathew, S.; van Gastel, Raoul; Nijland, Maarten; Gopinadhan, K.; Brinks, Peter; Venkatesan, T.; ten Elshof, Johan E.
  • 卷第9卷
  • 期第5期
  • 印刷ISSN1613-6810
  • 文件大小864.27KB
  • 发表时间2013-03-11
  • DOI10.1002/smll.201201889
  • 页码711-715
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