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Formation of stoichiometric, sub-stoichiometric undoped and hydrogen doped tungsten oxide films, enabled by pulsed introduction of O2 or H2 during hot-wire vapor deposition

Formation of stoichiometric, sub-stoichiometric undoped and hydrogen doped tungsten oxide films, enabled by pulsed introduction of O2 or H2 during hot-wire vapor deposition

Kostis, I.; Vourdas, N.; Vasilopoulou, M.; Douvas, A.; Papadimitropoulos, G.; Konofaos, N.; Iliadis, A.; Davazoglou, D.
  • 期刊名称Thin Solid Films
  • 作者Kostis, I.; Vourdas, N.; Vasilopoulou, M.; Douvas, A.; Papadimitropoulos, G.; Konofaos, N.; Iliadis, A.; Davazoglou, D.
  • 卷第537卷
  • 印刷ISSN0040-6090
  • 文件大小1134.57KB
  • 发表时间2013-06
  • DOI10.1016/j.tsf.2013.04.021
  • 页码124-130
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