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Structural and Electrical Properties of ZnO Films Deposited with Low-Temperature Facing Targets Magnetron Sputtering (FTS) System with Changes in H<SUB>2</SUB> and O<SUB>2</SUB> Flow Rate

Structural and Electrical Properties of ZnO Films Deposited with Low-Temperature Facing Targets Magnetron Sputtering (FTS) System with Changes in H2 and O2 Flow Rate

Kim, Hye Ran; Jin, Su Bong; Wen, Long; Choi, Yoon Seok; Choi, In Sik; Han, Jeon Geon
  • 期刊名称Journal of Nanoscience and Nanotechnology
  • 作者Kim, Hye Ran; Jin, Su Bong; Wen, Long; Choi, Yoon Seok; Choi, In Sik; Han, Jeon Geon
  • 卷第13卷
  • 期第11期
  • 印刷ISSN1533-4880
  • 电子ISSN1533-4899
  • 文件大小1192.97KB
  • 发表时间2013-11-01
  • DOI10.1166/jnn.2013.7810
  • 页码7745-7750
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