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Deposition of undoped and H doped WOx (x≤3) films in a hot-wire atomic layer deposition system without the use of tungsten precursors

Deposition of undoped and H doped WOx (x≤3) films in a hot-wire atomic layer deposition system without the use of tungsten precursors

Kostis, I.; Vasilopoulou, M.; Papadimitropoulos, G.; Stathopoulos, N.; Savaidis, S.; Davazoglou, D.
  • 期刊名称Surface and Coatings Technology
  • 作者Kostis, I.; Vasilopoulou, M.; Papadimitropoulos, G.; Stathopoulos, N.; Savaidis, S.; Davazoglou, D.
  • 卷第230卷
  • 印刷ISSN0257-8972
  • 文件大小1334.88KB
  • 发表时间2013-09
  • DOI10.1016/j.surfcoat.2013.06.021
  • 页码51-58
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