Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope

Amano, Tsuyoshi; Iida, Susumu; Hirano, Ryoichi; Terasawa, Tsuneo; Watanabe, Hidehiro; Yamasoe, Kenjiro; Toyoda, Mitsunori; Tokimasa, Akifumi; Harada, Tetsuo; Watanabe, Takeo; Kinoshita, Hiroo

期刊名称Applied Physics Express
作者Amano, Tsuyoshi; Iida, Susumu; Hirano, Ryoichi; Terasawa, Tsuneo; Watanabe, Hidehiro; Yamasoe, Kenjiro; Toyoda, Mitsunori; Tokimasa, Akifumi; Harada, Tetsuo; Watanabe, Takeo; Kinoshita, Hiroo
卷第6卷
期第4期
印刷ISSN1882-0778
电子ISSN1882-0786
文件大小418.63KB
发表时间2013-04-01
DOI10.7567/APEX.6.046501

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Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope