(Invited) Challenges and Opportunities for Doping Control in Ge for Micro and Optoelectronics Applications

Bruno, E.; Scapellato, G. G.; Napolitani, E.; Mirabella, S.; Boninelli, S.; La Magna, A.; Mastromatteo, M.; De Salvador, D.; Fortunato, G.; Privitera, V.; Priolo, F.

期刊名称ECS Transactions
作者Bruno, E.; Scapellato, G. G.; Napolitani, E.; Mirabella, S.; Boninelli, S.; La Magna, A.; Mastromatteo, M.; De Salvador, D.; Fortunato, G.; Privitera, V.; Priolo, F.
卷第50卷
期第5期
印刷ISSN1938-6737
电子ISSN1938-5862
文件大小325.28KB
发表时间2013-03-15
DOI10.1149/05005.0089ecst
页码89-103

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(Invited) Challenges and Opportunities for Doping Control in Ge for Micro and Optoelectronics Applications