Influence of Annealing Temperature on Microstructural and Optical Properties of TiN Thin Films Deposited by DC Reactive Magnetron Sputtering
- 期刊名称Advanced Materials Research
- 作者Rattana, T.; Witit-Anun, N.; Suwanboon, S.; Chaiyakun, S.
- 卷第770卷
- 电子ISSN1662-8985
- 文件大小460.58KB
- 发表时间2013-9
- DOI10.4028/www.scientific.net/AMR.770.197
- 页码197-200
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