SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Inverse lithography technique for advanced CMOS nodes
- 作者Villaret, Alexandre; Conley, Will; Tritchkov, Alexander; Entradas, Jorge; Yesilada, Emek
- 卷第8683卷
- 印刷ISSN0277-786X
- 文件大小1568.41KB
- 发表时间2013
- DOI10.1117/12.2010111
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