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The effect of increasing V content on the structure, mechanical properties and oxidation resistance of Ti–Si–V–N films deposited by DC reactive magnetron sputtering

The effect of increasing V content on the structure, mechanical properties and oxidation resistance of Ti–Si–V–N films deposited by DC reactive magnetron sputtering

Fernandes, F.; Loureiro, A.; Polcar, T.; Cavaleiro, A.

期刊名称Applied Surface Science
作者Fernandes, F.; Loureiro, A.; Polcar, T.; Cavaleiro, A.
卷第289卷
印刷ISSN0169-4332
文件大小3440.47KB
发表时间2014-01
DOI10.1016/j.apsusc.2013.10.117
页码114-123

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