发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

Influence of pulse power amplitude on plasma properties and film deposition in high power pulsed plasma enhanced chemical vapor deposition

Influence of pulse power amplitude on plasma properties and film deposition in high power pulsed plasma enhanced chemical vapor deposition

Lundin, Daniel; Jensen, Jens; Pedersen, Henrik

期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
作者Lundin, Daniel; Jensen, Jens; Pedersen, Henrik
卷第32卷
期第3期
印刷ISSN0734-2101
电子ISSN1520-8559
文件大小648.95KB
发表时间2014-05
DOI10.1116/1.4867442

← 返回【学霸图书馆】主页