Low inversion equivalent oxide thickness and enhanced mobility in MOSFETs with chlorine plasma interface engineering
Li, Chen-Chien; Chang-Liao, Kuei-Shu; Chen, Li-Ting; Fu, Chung-Hao; Hong, Hao-Zhi; Li, Mong-Chi; Chi, Wei-Fong; Lu, Chun-Chang; Ye, Zong-Hao; Wang, Tien-Ko
- 期刊名称Solid-State Electronics
- 作者Li, Chen-Chien; Chang-Liao, Kuei-Shu; Chen, Li-Ting; Fu, Chung-Hao; Hong, Hao-Zhi; Li, Mong-Chi; Chi, Wei-Fong; Lu, Chun-Chang; Ye, Zong-Hao; Wang, Tien-Ko
- 卷第101卷
- 印刷ISSN0038-1101
- 文件大小1879.10KB
- 发表时间2014-11
- DOI10.1016/j.sse.2014.06.028
- 页码33-37