Polymer-Confined Colloidal Monolayer: A Reusable Soft Photomask for Rapid Wafer-Scale Nanopatterning

Fang, Ming; Lin, Hao; Cheung, Ho-Yuen; Xiu, Fei; Shen, Lifan; Yip, SenPo; Pun, Edwin Yue-Bun; Wong, Chun-Yuen; Ho, Johnny C.

期刊名称ACS Applied Materials & Interfaces
作者Fang, Ming; Lin, Hao; Cheung, Ho-Yuen; Xiu, Fei; Shen, Lifan; Yip, SenPo; Pun, Edwin Yue-Bun; Wong, Chun-Yuen; Ho, Johnny C.
卷第6卷
期第23期
印刷ISSN1944-8244
电子ISSN1944-8252
文件大小5005.44KB
发表时间2014-12-10
DOI10.1021/am505221g
页码20837-20841

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