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Annealing temperature influence on the degree of inhomogeneity of the Schottky barrier in Ti/4H—SiC contacts

Annealing temperature influence on the degree of inhomogeneity of the Schottky barrier in Ti/4H—SiC contacts

Han, Lin-Chao; Shen, Hua-Jun; Liu, Ke-An; Wang, Yi-Yu; Tang, Yi-Dan; Bai, Yun; Xu, Heng-Yu; Wu, Yu-Dong; Liu, Xin-Yu
  • 期刊名称Chinese Physics B
  • 作者Han, Lin-Chao; Shen, Hua-Jun; Liu, Ke-An; Wang, Yi-Yu; Tang, Yi-Dan; Bai, Yun; Xu, Heng-Yu; Wu, Yu-Dong; Liu, Xin-Yu
  • 卷第23卷
  • 期第12期
  • 印刷ISSN1674-1056
  • 文件大小525.95KB
  • 发表时间2014-12
  • DOI10.1088/1674-1056/23/12/127302
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