Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists
- 期刊名称Japanese Journal of Applied Physics
- 作者Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro
- 卷第53卷
- 期第3期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小54.40KB
- 发表时间2014-03-01
- DOI10.7567/JJAP.53.036503
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