Doped Hafnium Oxide – An Enabler for Ferroelectric Field Effect Transistors
- 期刊名称Advances in Science and Technology
- 作者Mikolajick, Thomas; Müller, Stefan; Schenk, Tony; Yurchuk, Ekaterina; Slesazeck, Stefan; Schröder, Uwe; Flachowsky, Stefan; van Bentum, Ralf; Kolodinski, Sabine; Polakowski, Patrick; Müller, Johannes
- 卷第95卷
- 电子ISSN1662-0356
- 文件大小1195.06KB
- 发表时间2014-10
- DOI10.4028/www.scientific.net/ast.95.136
- 页码136-145
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