SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - Increased throughput, determined by a suite of benchmark patterns, in a Gaussian electron-beam lithography tool with a 100 MHz writing rate
Resnick, Douglas J.; Bencher, Christopher; Smith, James H.; Crosland, Nigel; Doran, Samuel; Dowling, Robert C.; Hartley, John G.; Hoyle, Philip C.; King, David M. P.; Kutcher, Lawrence; McClelland, Andrew; Turnidge, Martin
- 作者Resnick, Douglas J.; Bencher, Christopher; Smith, James H.; Crosland, Nigel; Doran, Samuel; Dowling, Robert C.; Hartley, John G.; Hoyle, Philip C.; King, David M. P.; Kutcher, Lawrence; McClelland, Andrew; Turnidge, Martin
- 卷第9049卷
- 印刷ISSN0277-786X
- 文件大小821.07KB
- 发表时间2014
- DOI10.1117/12.2046609