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[IEEE 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) - Bologna, Italy (2015.1.26-2015.1.28)] EUROSOI-ULIS 2015: 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon - Band structure of III-V thin films: An atomistic study of non-parabolic effects in confinement direction

[IEEE 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) - Bologna, Italy (2015.1.26-2015.1.28)] EUROSOI-ULIS 2015: 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon - Band structure of III-V thin films: An atomistic study of non-parabolic effects in confinement direction

Mugny, G.; Triozon, F.; Li, J.; Niquet, Y.-M.; Hiblot, G.; Rideau, D.; Delerue, C.

作者Mugny, G.; Triozon, F.; Li, J.; Niquet, Y.-M.; Hiblot, G.; Rideau, D.; Delerue, C.
文件大小510.84KB
发表时间2015
DOI10.1109/ulis.2015.7063833
页码301-304

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