Agglomeration and diffusion in Cu thin films under supercritical CO 2 annealing
- 期刊名称Japanese Journal of Applied Physics
- 作者Nakamura, Yoshiki; Watanabe, Mitsuhiro; Kondoh, Eiichi
- 卷第54卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小1058.86KB
- 发表时间2015-05-01
- DOI10.7567/jjap.54.05ea03
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