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Past Progress and Future Challenges in LSI Technology: From DRAM and Scaling to Ultra-Low-Power CMOS

Past Progress and Future Challenges in LSI Technology: From DRAM and Scaling to Ultra-Low-Power CMOS

Dennard, Robert H.

期刊名称IEEE Solid-State Circuits Magazine
作者Dennard, Robert H.
卷第7卷
期第2期
印刷ISSN1943-0582
文件大小2201.05KB
发表时间2015-21
DOI10.1109/MSSC.2014.2385965
页码29-38

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