Probing the molecular structures of plasma-damaged and surface-repaired low-k dielectrics
Zhang, Xiaoxian; Myers, John N.; Lin, Qinghuang; Bielefeld, Jeffery D.; Chen, Zhan
- 期刊名称Phys. Chem. Chem. Phys.
- 作者Zhang, Xiaoxian; Myers, John N.; Lin, Qinghuang; Bielefeld, Jeffery D.; Chen, Zhan
- 卷第17卷
- 期第39期
- 印刷ISSN1463-9076
- 电子ISSN1463-9084
- 文件大小2731.80KB
- 发表时间2015
- DOI10.1039/C5CP03649F
- 页码26130-26139