Recent Advances in Silica-Based Materials for the Removal of Hexavalent Chromium: A Review
- 期刊名称Journal of Chemical & Engineering Data
- 作者Dinker, Manish Kumar; Kulkarni, Prashant Shripad
- 卷第60卷
- 期第9期
- 印刷ISSN0021-9568
- 电子ISSN1520-5134
- 文件大小2187.19KB
- 发表时间2015-09-10
- DOI10.1021/acs.jced.5b00292
- 页码2521-2540
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