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Growth and characterization of (1 −
<i>x</i>
)BiFeO
<sub/>3</sub>
–
<i>x</i>
(Bi
<sub/>0.5</sub>
,K
<sub/>0.5</sub>
)TiO
<sub/>3</sub>
thin films

Growth and characterization of (1 − x )BiFeO ₃ – x (Bi _0.5 ,K _0.5 )TiO ₃ thin films

Choi, Jin Hong; Yoshimura, Takeshi; Fujimura, Norifumi

期刊名称Japanese Journal of Applied Physics
作者Choi, Jin Hong; Yoshimura, Takeshi; Fujimura, Norifumi
卷第54卷
印刷ISSN0021-4922
电子ISSN1347-4065
文件大小907.62KB
发表时间2015-10-01
DOI10.7567/JJAP.54.10NA14

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