[IEEE 2015 73rd Annual Device Research Conference (DRC) - Columbus, OH, USA (2015.6.21-2015.6.24)] 2015 73rd Annual Device Research Conference (DRC) - Enhanced Ge n-channel gate stack performance using HfAlO high-k dielectric

• 作者Kothari, Shraddha; Joishi, Chandan; Biswas, Dipankar; Vaidya, Dhirendra; Ganguly, Swaroop; Lodha, Saurabh
• 文件大小1322.63KB
• 发表时间2015
• DOI10.1109/DRC.2015.7175687
• 页码285-286