![SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Qualification of BitClean technology in photomask production]()
SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Qualification of BitClean technology in photomask productionRobinson, Tod; Montgomery, M. Warren; Maurer, Wilhelm; White, Roy; Bozak, Ron; Archuletta, Mike; Brinkley, David; Yi, Daniel · 2010