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The Influence of Deposition Rate on the Structure and Morphology of Gold/Silicon(111) Growth by Molecular Beam Epitaxy

The Influence of Deposition Rate on the Structure and Morphology of Gold/Silicon(111) Growth by Molecular Beam Epitaxy

Marconi, Daniel; Colniţă, Alia; Turcu, Ioan
  • 期刊名称Analytical Letters
  • 作者Marconi, Daniel; Colniţă, Alia; Turcu, Ioan
  • 卷第49卷
  • 期第3期
  • 印刷ISSN0003-2719
  • 电子ISSN1532-236X
  • 文件大小1380.11KB
  • 发表时间2016-02-11
  • DOI10.1080/00032719.2015.1022823
  • 页码400-410
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