Investigations on the Gate-Induced Drain Leakage Current of Polycrystalline-Silicon Thin-Film Transistor and Its Suppression With Drain Bias Sweep
Zhang, Dongli; Wang, Mingxiang; Wang, Huaisheng; Shan, Qi
- 期刊名称IEEE Transactions on Electron Devices
- 作者Zhang, Dongli; Wang, Mingxiang; Wang, Huaisheng; Shan, Qi
- 印刷ISSN0018-9383
- 电子ISSN1557-9646
- 文件大小2334.10KB
- 发表时间2016
- DOI10.1109/TED.2016.2533162
- 页码1-6