Pattern inspection of etched multilayer extreme ultraviolet mask
Iida, Susumu; Hirano, Ryoichi; Amano, Tsuyoshi; Watanabe, Hidehiro
- 期刊名称Journal of Micro/Nanolithography, MEMS, and MOEMS
- 作者Iida, Susumu; Hirano, Ryoichi; Amano, Tsuyoshi; Watanabe, Hidehiro
- 卷第15卷
- 期第2期
- 印刷ISSN1932-5150
- 文件大小3266.78KB
- 发表时间2016-01-29
- DOI10.1117/1.jmm.15.2.021002