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Pattern inspection of etched multilayer extreme ultraviolet mask

Pattern inspection of etched multilayer extreme ultraviolet mask

Iida, Susumu; Hirano, Ryoichi; Amano, Tsuyoshi; Watanabe, Hidehiro
  • 期刊名称Journal of Micro/Nanolithography, MEMS, and MOEMS
  • 作者Iida, Susumu; Hirano, Ryoichi; Amano, Tsuyoshi; Watanabe, Hidehiro
  • 卷第15卷
  • 期第2期
  • 印刷ISSN1932-5150
  • 文件大小3266.78KB
  • 发表时间2016-01-29
  • DOI10.1117/1.jmm.15.2.021002
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