Deposition Mechanism of Aluminum Oxide on Quantum Dot Films at Atmospheric Pressure and Room Temperature

Valdesueiro, David; Prabhu, Mahesh Krishna; Guerra-Nunez, Carlos; Sandeep, C. S. Suchand; Kinge, Sachin; Siebbeles, Laurens D. A.; de Smet, Louis C. P. M.; Meesters, Gabrie M. H.; Kreutzer, Michiel T.; Houtepen, Arjan J.; van Ommen, J. Ruud

期刊名称The Journal of Physical Chemistry C
作者Valdesueiro, David; Prabhu, Mahesh Krishna; Guerra-Nunez, Carlos; Sandeep, C. S. Suchand; Kinge, Sachin; Siebbeles, Laurens D. A.; de Smet, Louis C. P. M.; Meesters, Gabrie M. H.; Kreutzer, Michiel T.; Houtepen, Arjan J.; van Ommen, J. Ruud
卷第120卷
期第8期
印刷ISSN1932-7447
电子ISSN1932-7455
文件大小2989.13KB
发表时间2016-03-03
DOI10.1021/acs.jpcc.5b11653
页码4266-4275

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Deposition Mechanism of Aluminum Oxide on Quantum Dot Films at Atmospheric Pressure and Room Temperature