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Measuring the high performance of five-stage ring VCO with reverse body bias technique in 45 nm CMOS technology

Measuring the high performance of five-stage ring VCO with reverse body bias technique in 45 nm CMOS technology

Shrivastava, Akansha; Saxena, Anshul; Akashe, Shyam

期刊名称International Journal of Signal and Imaging Systems Engineering
作者Shrivastava, Akansha; Saxena, Anshul; Akashe, Shyam
卷第9卷
期第2期
印刷ISSN1748-0698
电子ISSN1748-0701
文件大小863.56KB
发表时间2016
DOI10.1504/ijsise.2016.075001

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