SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)
- 作者Erdmann, Andreas; Kye, Jongwook; Bourgin, Yannick; Voigt, Daniel; Käsebier, Thomas; Kley, Ernst-Bernhard; Zeitner, Uwe D.
- 卷第9780卷
- 印刷ISSN0277-786X
- 文件大小2863.80KB
- 发表时间2016
- DOI10.1117/12.2218610
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