SPIE Proceedings [SPIE SPIE Defense + Security - Baltimore, Maryland, United States (Sunday 17 April 2016)] Tri-Technology Device Refrigeration (TTDR) - Effect of chemical pressure manipulation on the valence and thermoelectric properties of the intermediate valence compound YbCu 2-x Ni x Ge 2
- 作者Epstein, Richard I.; Andresen, Bjørn F.; Hehlen, Markus P.; Heremans, Joseph P.; Rühlich, Ingo N.; Sheik-Bahae, Mansoor; Lehr, Gloria J.; Waldrop, Spencer L.; Carr, Winston D.; Morelli, Donald T.
- 卷第9821卷
- 印刷ISSN0277-786X
- 文件大小466.17KB
- 发表时间2016
- DOI10.1117/12.2228757
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