SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Integrated Circuit Metrology, Inspection, and Process Control IV - <title>Environmental effects on registration and accuracy data on quartz photomasks utilizing the LMS-2000 laser metrology system</title>Land, Larry E.; Whittey, John M.; Arnold, William H. · 1990