![Erratum: Effect of thermal annealing treatments on the optical activation of Tb
<sup>3+</sup>
-doped amorphous SiC:H thin films (2016
<i>J. Phys. D: Appl</i>
.
<b>49</b>
375104)]()
Erratum: Effect of thermal annealing treatments on the optical activation of Tb
<sup>3+</sup>
-doped amorphous SiC:H thin films (2016
<i>J. Phys. D: Appl</i>
.
<b>49</b>
375104)Guerra, J A; De Zela, F; Tucto, K; Montañez, L; Töfflinger, J A; Winnacker, A; Weingärtner, R · Journal of Physics D: Applied Physics · 2016