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A hybrid chemo-/grapho- epitaxial alignment strategy for defect reduction in sub-10 nm directed self-assembly of silicon-containing block copolymers

A hybrid chemo-/grapho- epitaxial alignment strategy for defect reduction in sub-10 nm directed self-assembly of silicon-containing block copolymers

Blachut, Gregory; Sirard, Stephen M.; Maher, Michael J.; Asano, Yusuke; Someya, Yasunobu; Lane, Austin P.; Durand, William J.; Bates, Christopher M.; Dinhobl, Andrew M.; Gronheid, Roel; Hymes, Diane; Ellison, Christopher J; Willson, C. Grant
  • 期刊名称Chemistry of Materials
  • 作者Blachut, Gregory; Sirard, Stephen M.; Maher, Michael J.; Asano, Yusuke; Someya, Yasunobu; Lane, Austin P.; Durand, William J.; Bates, Christopher M.; Dinhobl, Andrew M.; Gronheid, Roel; Hymes, Diane; Ellison, Christopher J; Willson, C. Grant
  • 印刷ISSN0897-4756
  • 电子ISSN1520-5002
  • 文件大小3470.99KB
  • 发表时间2016-11-23
  • DOI10.1021/acs.chemmater.6b03633
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