Challenges in Development of Sub-10 nm Resist Materials
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro
- 卷第29卷
- 期第5期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小602.22KB
- 发表时间2016
- DOI10.2494/photopolymer.29.717
- 页码717-723
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