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Effect of sputtering target's grain size on the sputtering yield, particle size and coercivity (Hc) of Ni and Ni20Al thin films

Effect of sputtering target's grain size on the sputtering yield, particle size and coercivity (Hc) of Ni and Ni20Al thin films

Reza, M; Sajuri, Z; Yunas, J; Syarif, J

期刊名称IOP Conference Series: Materials Science and Engineering
作者Reza, M; Sajuri, Z; Yunas, J; Syarif, J
卷第114卷
印刷ISSN1757-8981
电子ISSN1757-899X
文件大小1354.73KB
发表时间2016-02
DOI10.1088/1757-899X/114/1/012116

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