(Invited) Current Stage of the Investigation of the Composition of Oxygen Precipitates in Czochralski Silicon Wafers
- 期刊名称ECS Transactions
- 作者Kot, D.; Kissinger, G.; Schubert, M. A.; Sattler, A.
- 卷第75卷
- 期第4期
- 印刷ISSN1938-6737
- 电子ISSN1938-5862
- 文件大小1408.32KB
- 发表时间2016-09-23
- DOI10.1149/07504.0053ecst
- 页码53-67
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