![SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - <title>Reduction of radial CD errors and Cr loading effects in 90-nm binary NCAR mask process through chrome etch DOE</title>]()
SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - <title>Reduction of radial CD errors and Cr loading effects in 90-nm binary NCAR mask process through chrome etch DOE</title>Ma, Jian; Li, Chaoyang; Bassist, Larry; Pekney, Matthew; Wilcox, Nathan; Farnsworth, Jeff; Lauder, Edward; Krishnakumar, B.; Staud, Wolfgang; Weed, J. Tracy · 2004