Evolution of grain structure and recombination active dislocations in extraordinary tall conventional and high performance multi-crystalline silicon ingots

• 期刊名称Journal of Crystal Growth
• 作者Trempa, M.; Kupka, I.; Kranert, C.; Lehmann, T.; Reimann, C.; Friedrich, J.
• 卷第459卷
• 印刷ISSN0022-0248
• 文件大小1266.29KB
• 发表时间2017-02
• DOI10.1016/j.jcrysgro.2016.11.030
• 页码67-75