Influence of deposition rate on the structural properties of plasma-enhanced CVD epitaxial silicon

• 期刊名称Scientific Reports
• 作者Chen, Wanghua; Cariou, Romain; Hamon, Gwenaëlle; Léal, Ronan; Maurice, Jean-Luc; Cabarrocas, Pere Roca i
• 卷第7卷
• 电子ISSN2045-2322
• 文件大小1567.43KB
• 发表时间2017-3-6
• DOI10.1038/srep43968